PE Plasma Clean Etch Equipment
PE75 Plasma Etch Model
Model:
The Plasma Etch, Inc. PE-75 is our largest entry level plasma system and offers many features not found in competitive units.This system features a circular aluminum vacuum chamber that is 12&rdquo in diameter and 11&rdquo deep with a direct powered RF electrode. As in all Plasma Etch Systems, a capacitive parallel plate design is used for the most effective plasma generation.The compact size and affordability of the PE-75 makes this system perfect for smaller production facilities, R&D facilities, and universities.
BENEFITS
- Direct RF contact (capacitive parallel plate) is used for uniform plasma generation
- Equipped with PLC control, Full Automation Plasma Cleaning machine
- Durable Aluminum Vacuum Chamber
- Approximate Inside Dimensions 12" Diameter x 11" Deep
- Single 9"W x 10"D horizontal Direct Contact RF powered electrode
- 5.5" (minimum) chamber height clearance
- 400 Watt, 50 KHz Continuously variable RF power supply
- 2 Rotometers, 2 Gas Controls, 0-25cc/min w/Precision Needle Valves
- Thermocouple Vacuum Gauge, 0-1 Torr
- PLC Microprocessor Control System
- Console Dimensions: 18" W X 19" X 24"H
- 5 CFM 2-Stage Direct Drive Oil Vacuum Pump
- Plasma sterilization
- Surface modification